B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
(Nanowerk News) Integrated optical signal distributing, processing, and sensing networks require the miniaturization of basic optical elements, such as waveguides, splitters, gratings, and optical ...
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DIY semiconductor patterning
DIY photolithography using a direct write laser machine. This is a maskless technique (similar to projection lithography) to ...
Metalenses have been used to image microscopic features of tissue and resolve details smaller than a wavelength of light. Now, Harvard researchers have turned the metalens towards space. Researchers ...
Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...
M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...
In the semiconductor materials industry, photolithography is a crucial technology for creating intricate electronic circuits. Essentially, it’s the art of printing at the nanoscale level, enabling the ...
(Nanowerk News) Integrated optical signal distributing, processing, and sensing networks require the miniaturization of basic optical elements, such as waveguides, splitters, gratings, and optical ...
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