A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists. Chemically tailored for reliable directed ...
“While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the ...
The self-assembly of block copolymer thin films can generate dense nanoscale patterns over large areas 1,2,3,4,5,6,7,8. When directed by a sparse topographic or chemical template, the block copolymers ...
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